Growth Enhancement of Radish Seed Induced by Low-Temperature Argon Plasma

Abstract The process of seed germination is described as the culmination a series events that start with wetting and end emergence embryo (typically radicle) from coat. This method has an impact on crop output quality. characteristics surface surroundings have kinetics volume water absorption by seeds. As result, modifying seed's useful tactic for influencing germination. Low-temperature plasma (LTP) treatment activation now being researched effective pre-sowing technique. study looked at effects LTP radish ( Raphanus sativus ) seeds room temperature various times. properties, growth parameters, contact angle (WCA), Scanning Electron Micrograph (SEM), FTIR analysis were examined. WCA SEM examination revealed considerable alteration in coat following treatment, which directly connected to permeability into Similarly, confirmed enhancement hydrophilic properties likely due damage hydrophobic moieties seeds' surface. improved each germination-related parameter, including vigor index, chlorophyll content, in-vitro radical scavenging activities, total flavonoid, phenol seedlings. Our findings indicate beneficial early sprouting development radish.